추천 제품
Grade
standard
Quality Level
구성
volatiles, 85%
색상
clear yellow-orange
bp
100 °C/1 atm
density
1.16 g/mL at 25 °C
일반 설명
Nichrome etchant is a high purity etching system that is a mixture of ceric ammonium nitrate and nitric acid. It can be used to etch the nickel and chromium alloy.
애플리케이션
Ceric ammonium nitrate-based etchant. Etches Al, Cr, Cu, Ni, GaAs. Surface oxidizes Si, Ta/TaN. Etch rate of 50 Å/sec @ 40 °C. Etches cleanly with only a deionized water rinse needed.
For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse.
Nichrome etchant is used in the fabrication of microheater patterns of polydimethyl siloxane (PDMS), silica (SiO2) and glass substrates, which can be further used in the fabrication of flow sensors. It may also be used to etch out nickel (Ni) from the electroplated Ni on amorphous silica wafers.
특징 및 장점
Designed for etching nichrome thin films used in microelectronic applications. Compatible with both positive and negative photoresists and provides fine-line control with minimal undercutting. Filtered to 0.2 micron to remove particlulates and composed of semiconductor grade materials.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1
보충제 위험성
Storage Class Code
5.1B - Oxidizing hazardous materials
WGK
WGK 3
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
Simulation and feasibility study of flow sensor on flexible polymer for healthcare application.
Maji D and Das S
IEEE Transactions on Bio-Medical Engineering, 60(12), 3298-3305 (2013)
Perfectly plastic flow in silica glass.
Kermouche G, et al.
Acta Materialia, 114(12), 146-153 (2016)
프로토콜
Negative Photoresist Procedure
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