모든 사진(1)
About This Item
Linear Formula:
(C2H5)2SiCl2
CAS Number:
Molecular Weight:
157.11
Beilstein:
605313
EC Number:
MDL number:
UNSPSC 코드:
12352001
PubChem Substance ID:
NACRES:
NA.22
추천 제품
Quality Level
분석
97%
양식
liquid
refractive index
n20/D 1.43 (lit.)
bp
125-131 °C (lit.)
density
1.05 g/mL at 25 °C (lit.)
저장 온도
2-8°C
SMILES string
CC[Si](Cl)(Cl)CC
InChI
1S/C4H10Cl2Si/c1-3-7(5,6)4-2/h3-4H2,1-2H3
InChI key
BYLOHCRAPOSXLY-UHFFFAOYSA-N
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신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 3 - Skin Corr. 1B - STOT SE 3
표적 기관
Respiratory system
보충제 위험성
Storage Class Code
3 - Flammable liquids
WGK
WGK 1
Flash Point (°F)
79.0 °F
Flash Point (°C)
26.1 °C
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
이미 열람한 고객
Peter Bieling et al.
The EMBO journal, 37(1), 102-121 (2017-11-17)
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David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation
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