774022

酸化イットリウム(III)

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.99% trace metals basis

• 別名: イットリア
• 化学式: Y₂O₃
• CAS Number: 1314-36-9
• 分子量: 225.81
• EC Number: 215-233-5
• MDL番号: MFCD00011473
• UNSPSCコード: 12352302
• PubChem Substance ID: 329767654
• NACRES: NA.23

特性

• アッセイ: 99.99% trace metals basis
• フォーム: powder
• 反応適合性: core: yttrium
• 直径×厚み: 2.00 in. × 0.25 in.
• mp: 2410 °C (lit.)
• 密度: 5.01 g/mL at 25 °C (lit.)
• SMILES記法: O=[Y]O[Y]=O
• InChI: 1S/3O.2Y
• InChI Key: SIWVEOZUMHYXCS-UHFFFAOYSA-N

詳細

アプリケーション

Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium oxide sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing films are used as thermal barrier and protective coatings in thermoelectric devices, rare earth doped yttrium oxide films are studied for phosphor applications.

安全性情報

• 保管分類コード: 13 - Non Combustible Solids
• WGK: WGK 1
• 引火点(°F): Not applicable
• 引火点(℃): Not applicable